Table of Contents

3-omega Method

Heater Deposition

Typically, heaters are patterned using the following photolithography procedures:

  1. Samples are first cleaned with 18 MΩcm DI water, acetone, methanol, isopropynol, DI water, each in an ultrasonic bath for 15 minutes.
  2. Samples are then blown dry with nitrogen and baked at 115 C for two minutes.
  3. PR Primer (S100?) spun onto sample at 3000 rpm for 30 seconds
  4. Soft bake at 85 C for two minutes
  5. S1813 positive photoresist spun on at 3000 rpm for 30 seconds
  6. Soft bake at 85 C for two minutes
  7. The photoresist is exposed through a chrome-quartz mask. This mask should be cleaned to remove dust and other debris prior to putting it in the mask aligner. For Si substrates with thin films, a 6 second exposure at (POWER?) achieves good results.
  8. The PR is developed in (CHEM?) for 15 seconds, followed by an immediate rinse in DI water
  9. Hard bake at 115 C for two minutes
  10. Samples are sonicated for 15 minutes in 18 MΩcm DI water to remove PR residue
  11. Al is deposited by thermal evaporation. Base pressure should be less than 5 uTorr. Substrates are heated to approximately 150 C during the deposition to assure good adhesion of the Al. If a series of samples is being made, it is advisable to deposit the Al on all heaters simultaneously to achieve consistent TCR and thermal interface results.
  12. Samples should be cooled to room temperature before removing from vacuum! Otherwise, the Al will oxidize.
  13. Samples are sonicated in acetone to remove the unwanted PR and Al. This lift-off process takes about 5-10 minutes. Acetone residue is removed with IPA and samples are blown dry with nitrogen.

Measurement Software

Currently, measurements are taken with a LabVIEW VI. The VI communicates with the SR850 lock-in amplifier and an Agilent oscilloscope. The VI cycles the source through a series of applied voltage frequencies and waits for the lock-in measurement of the 3-omega voltage to become stable. It does this by actively measuring (typically with a 100 Hz sample rate) the amplitude of the 3-omega signal and comparing the derivative of this to a user-set threshold. The VI determines the signal is stable when the derivative is below this threshold for a set number of data points (usually around 100). The user can set the derivative threshold and the sample rate from the VI front panel.

Once the signal is stable, the VI records the in and out of phase 3-omega voltages and the 1-omega rms voltage (channel 1) and current (channel 2) measurements from the oscilloscope. The program auto-scales the oscilloscope window for measurements over the entire frequency range.

Once the frequency range has been swept, the VI prompts the user for a location to save the data. This data is in a tab separated value format with the following column structure: 1-omega frequency (Hz), in-phase 3-omega voltage (mV), out-of-phase 3-omega voltage (mV), 1-omega voltage (mV), 1-omega current (mA).

Useful Publications

Correspondence

River's 11/13 email on Al heaters

Aluminum is the way to go for the 3-omega heaters (it is the only material that we've had success with for thin film measurements). 

Ram and I tried nickel heaters on tetrahedrite w/ MnS insulating layer; the nickel reacted with the underlying film during dep, resulting in unusable heaters. 
In principle, Ni would be better than Al for 3-omega measurements as it has a significantly higher electrical resistivity and temperature coefficient of resistance. 

Ram and I made another attempt with Al heaters on tetrahedrite films before I left. The films were extremely rough post-anneal, resulting in broken heaters. 

Email correspondence from Jean-Yves Duquesne of Université Pierre et Marie Curie to River Wiedle (10 May 2011):

Modern lockins are able to detect coherent harmonic signal. So, in contrast to D.Cahill original setup, there is no need to synthetize a
reference triple harmonic 3w.

The temperature of the sample is regulated.

R_0 is measured accuratly: 4-wires measurement.

R_a is adjusted in order to null the output of the differential amp at the fundamental frequency w.

At every frequency, the current is measured (phase and amplitude),
thanks to the well calibrated R_i. Since the 3w signal is proportional
to I^3, it is important to monitor |I| and to keep it constant trough
the whole frequency range.

To link the measured voltage to the modulated temperature, you have to
measure accuratly the transmittance of A1+A3. For that purpose, A2 input
is shortened. The thermal transducer can replaced with a well calibrated
resistor R_r (its value is close to R_0). The frequency is swept. Input
tension on A1 is deduced from the measured current (in the calibrated
R_i) and from R_r value. Output tension (A3) is measured.

Electrical contacts to the transducer are done with conductive epoxy.
With some practice, it is possible to make small contacts, say ~300x300
µm. I avoid ultrasonic bonding since this can perforate the deposited
films.

Metal/semiconductor contacts are usually non linear, from an electrical
point of view. Then, very large harmonic signals can be produced when a
current is flowing in the thermal transducter. So it is advisable to
introduce an insulating layer between the transducer and the SC film of
interest.

Schematic of Duquesne 3w setup

Equipment & Manuals

Apparatus Development Log

Measurement System Concerns

Measurements at low frequency

Measurements at high frequency

Phase measurements

Heater Design and Deposition

Automation

Contacts

People

The system was set up in 2011 by River Wiedle in collaboration with Mark Warner. Matt Oostman worked on the project Fall 2011→2012 Nico Schmidt Spring 2012 → Fall 2012